High resolution: High resolution imaging system is adopted to improve particle inspection sensitivity to micron level.
High detection rate: Various lighting modes areconfigured toenhance the adaptability of different defect inspection processes.
High yield:3 independent SMIF versionsare equippedto improve the equipment yield.
Particle cleaning: Air bath module are equipped, so thatthe particles on the glass surface can becleaned accurately.
Factory automation:It supportsSECS/GEM SEMI standard, which can fully meet the requirements of factory automation.
